Set – Skin Care Products

Description

Age:18+
Brand:Paul Mitchell
Line:MVRCK
Product Type:Set
Product Properties:Moisturizing, Nourishment, Styling, Toning
Set Includes:Face Lotion, Hair Pomade
Ingredients:Allantoin, Arginine, Barley, Bitter Orange, Glycerin, Panthenol, Rapeseed (canola), Shea Butter (Karite), Vitamin E
Feature:Animal-friendly
When To Use:Universal
Gender:For men
Classification:Professional
Skin Type:All Types
Country:USA
Made in:USA

Set Includes:Skin and Beard Lotion – Paul Mitchell MVRCK Skin + Beard Lotion, 75 ml + High Hold Hair Pomade – Paul Mitchell MVRCK High Hold Pomade, 85 g

Skin and Beard Lotion – Paul Mitchell MVRCK Skin + Beard Lotion
The MVRCK Lotion by Paul Mitchell is a comprehensive product for men, providing facial skin care and beard hydration simultaneously. Its formula, based on barley seed extract, soothes irritation, eliminates dryness, and prevents post-shave or beard styling rashes. It deeply nourishes the hair, giving it elasticity and a natural shine.

Features of Paul Mitchell MVRCK Skin + Beard Lotion:
– Has a citrus agave scent;
– Helps style coarse, rough hair, making it more manageable;
– Provides smoothness and softness, eliminating frizz;
– Leaves no greasy or sticky residue;
– Prevents facial skin flaking and itching;
– Balances skin hydration and strengthens its protective barrier.

High Hold Hair Pomade – Paul Mitchell MVRCK High Hold Pomade
The Paul Mitchell MVRCK High Hold Pomade is perfect for controlled styling and a sleek look that lasts all day. This water-based pomade washes out easily and does not flake.

The MVRCK® High Hold Pomade is ideal for any style, from waves to a pompadour, providing excellent hold and shine for optimal control that keeps your hairstyle intact throughout the day.

Lotion for Skin and Beard – Paul Mitchell MVRCK Skin + Beard Lotion
Apply the lotion as a moisturizing cream to the facial skin.

High Hold Hair Styling Pomade – Paul Mitchell MVRCK High Hold Pomade
Apply a small amount of the product to dry hair and style as desired.